Ion Implantation Overview

SCP005 - 8.00 Hours

Description

The seminar on Ion Implantation provides an overview of equipment issues, process parameters and key quality control issues. Emphasis is placed on the advantages of ion implantation types of source elements used, selection of the proper ion species, maintenance of high vacuum on the implanter, beam focusing, scanning systems, and end point detection. Process issues related to silicon crystal orientation, channeling, trench processing, implant depth, metrology, and post implant annealing are included. Download the in-depth course description.

This course can be scheduled to meet your specific needs. For more information about this course or to schedule a class for your organization, please contact Knowledge Engineering at (800) 541-7149 or ke@teex.tamu.edu.

Description

The seminar on Ion Implantation provides an overview of equipment issues, process parameters and key quality control issues. Emphasis is placed on the advantages of ion implantation types of source elements used, selection of the proper ion species, maintenance of high vacuum on the implanter, beam focusing, scanning systems, and end point detection. Process issues related to silicon crystal orientation, channeling, trench processing, implant depth, metrology, and post implant annealing are included. Download the in-depth course description.

Prerequisites

There are no prerequisites for this course.

Topics

Annealing methods +Implant depth +Implantation process +Introduction to ion implantation +Ion implantation equipment and sub assemblies +Masking +Material considerations +Process control +Scanning techniques +Source compounds

Suggested Audience

Those of all skill levels having an interest in an introduction to ion implantation processes.

Other Information

Please call customer service at 1-800-541-7149 for more information or email us at ke@teex.tamu.edu

Contact Information

Knowledge Engineering
Phone: (979) 458-6710 | Tollfree: (800) 541-7149

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